고집적 반도체 미세가공용 포토레지스트 재료Review Articles : Photoresist Materials for Microlithography
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김진백 | ko |
| dc.date.accessioned | 2013-02-27T19:38:00Z | - |
| dc.date.available | 2013-02-27T19:38:00Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1998 | - |
| dc.identifier.citation | JOURNAL OF KOREAN SOCIETY FOR IMAGING SCIENCE & TECHNOLOGY(한국화상학회지), v.4, no.1, pp.47 - 55 | - |
| dc.identifier.issn | 1226-0517 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/70433 | - |
| dc.language | Korean | - |
| dc.publisher | 한국화상학회지 | - |
| dc.title | 고집적 반도체 미세가공용 포토레지스트 재료 | - |
| dc.title.alternative | Review Articles : Photoresist Materials for Microlithography | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 4 | - |
| dc.citation.issue | 1 | - |
| dc.citation.beginningpage | 47 | - |
| dc.citation.endingpage | 55 | - |
| dc.citation.publicationname | JOURNAL OF KOREAN SOCIETY FOR IMAGING SCIENCE & TECHNOLOGY(한국화상학회지) | - |
| dc.contributor.localauthor | 김진백 | - |
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