ATOMIC MODEL FOR HYDROGEN PASSIVATION OF DX CENTERS IN GAAS AND ALXGA1-XAS ALLOYS

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We present the atomic model for the hydrogen passivation of DX centers in GaAs and AlxGa1-xAs alloys doped with Si and S donors using an ab initio pseudopotential method. In GaAs, the DX centers with the negative-U property are found to be stabilized at pressures above 22 kbar. Both the shallow donors and deep DX centers are neutralized by hydrogen via the formation of donor-hydrogen complexes which are neutral in a charge state. In AlxGa1-xAs alloys, we study the effects of the Al atoms on the interactions between H and its neighboring atoms. The calculated dissociation energies for the donor-hydrogen complexes agree with measured values.
Publisher
PERGAMON-ELSEVIER SCIENCE LTD
Issue Date
1992-12
Language
English
Article Type
Article
Keywords

CRYSTALLINE SILICON; PERSISTENT PHOTOCONDUCTIVITY; DONOR; DIFFUSION; ALGAAS; LEVEL

Citation

SOLID STATE COMMUNICATIONS, v.84, no.11, pp.1005 - 1009

ISSN
0038-1098
URI
http://hdl.handle.net/10203/66587
Appears in Collection
PH-Journal Papers(저널논문)
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