전자 싸이클로트론 공명 플라즈마 화학증착법에 의한 실리콘 질화막 형성 및 특성연구On the silicon nitride film formation and characteristic study by chemical vapor deposition method using electron cyclotron resonance plasma
- Publisher
- 한국표면공학회
- Issue Date
- 1992
- Language
- Korean
- Citation
한국표면공학회지, v.25, no.6, pp.287 - 292
- ISSN
- 1225-8024
- Appears in Collection
- PH-Journal Papers(저널논문)
- Files in This Item
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.