반응성 CVD를 이용한 다결정 실리콘 기판에서의 $CoSi_2$ layer의 성장거동과 열적 안정성에 관한 연구 = Growth behavior and thermal stability of $CoSi_2$ layer on poly-Si substrate using reactive chemical vapor deposition

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Advisors
안병태researcherAhn, Byung-Taeresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
2001
Identifier
169432/325007 / 020003083
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 재료공학과, 2001.8, [ 75 p. ]

Keywords

화학기상증착법; 열적안정성; 코발트 실리사이드; TiN; chemical vapor deposition; thermal stability

URI
http://hdl.handle.net/10203/50843
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=169432&flag=dissertation
Appears in Collection
MS-Theses_Master(석사논문)
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