LPCVD 공정의 3차원 증착형상 예측을 위한 전산모사Simulation for the 3-D deposition topography of LPCVD process
- Advisors
- 이원종researcher; Lee, Won-Jongresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 2000
- Identifier
- 158587/325007 / 000983042
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 재료공학과, 2000.2, [ ix, 109 p. ]
- Keywords
증착; 전산모사; 저압화학증착; 층덮힘; 부착계수; Deposition; LPCVD; Simulation; Monte Carlo method; Step coverage
- Appears in Collection
- MS-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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