$O_2/Cl_2$ ECR 플라즈마를 이용한 $RuO_2$ 박막의 건식 식각특성에 관한 연구Dry etching chacrateristics of $RuO_2$ thin film in $O_2/Cl_2$ electron cycl0tron resonance plasma
- Advisors
- 이원종researcher; Lee, Won-Jongresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1997
- Identifier
- 113132/325007 / 000953113
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 재료공학과, 1997.2, [ [ii], 79 p. ]
- Keywords
플라즈마식각; 염소플라즈마; ECR; Plasma etching
- Appears in Collection
- MS-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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