0.25mm 광리소그래피 결상에 존재하는 근접효과와 그 감소 방안에 관한 연구 = A study of the proximity effect present in the image forming process of the 0.25 micrometer photolithography and its reduction

Advisors
전덕영researcherJeon, Duk-Youngresearcher
Publisher
한국과학기술원
Issue Date
1996
Identifier
108833/325007 / 000947511
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 재료공학과, 1996.8, [ vi, 64 p. ]

Keywords

미세리소그래피; 부분간섭성; 홉킨스 이론; 근접효과; 삼위상형 위상반전매스크; Tri-phase type PSM; Microlithography; Partial coherence; Hopkins theory; Proximity effect

URI
http://hdl.handle.net/10203/50610
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=108833&flag=t
Appears in Collection
MS-Theses_Master(석사논문)
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