Reactive magnetron sputter ion plating법에 의해 증착된 TiN 박막의 특성에 관한 연구A study on characteristics of the TiN thin films deposited by reactive magnetron sputter ion plating.
- Advisors
- 이원종researcher; Lee, Won-Jongresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1996
- Identifier
- 106604/325007 / 000943013
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 재료공학과, 1996.2, [ iv, 73 p. ]
- Keywords
이온플레이팅; TiN; PVD; Ion plating
- Appears in Collection
- MS-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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