$p^+$ polysilicon 층 위에 저압화학증착된 $WSi_x$ 박막의 열처리에 따른 전기적 특성Electrical properties of annealed $WSi_x$ films depostied on $p^+$ polysilicon by LPCVD
- Advisors
- 임호빈researcher; Im, Ho-Binresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1991
- Identifier
- 68058/325007 / 000891416
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 재료공학과, 1991.2, [ iii, 53 p. ]
- Appears in Collection
- MS-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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