$Pb_5Ge_3O_{11}$ 강유전체 박막과 $HfAl_xO_y$ (x=0 또는 0.81) 유전체 박막을 이용한 MFIS 커패시터의 제조 및 특성 평가 = Fabrication and characterization of MFIS capacitors using ferroelectric $Pb_5Ge_3O_{11}$ and dielectric $HfAl_xO_y$ (x=0 or 0.81) thin films

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dc.contributor.advisor김호기-
dc.contributor.advisorKim, Ho-Gi-
dc.contributor.author박정호-
dc.contributor.authorPark, Jeong-Ho-
dc.date.accessioned2011-12-15T01:04:42Z-
dc.date.available2011-12-15T01:04:42Z-
dc.date.issued2003-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=181087&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/50282-
dc.description학위논문(박사) - 한국과학기술원 : 재료공학과, 2003.2, [ iv, 109 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subject$HfAl_xO_y$ (x=0 또는 0.81)-
dc.subject강유전체 박막-
dc.subject$Pb_5Ge_3O_{11}$-
dc.subjectMFIS 커패시터-
dc.subjectMFIS capacitor-
dc.subject$HfAl_xO_y$ (x=0 or 0.81)-
dc.subjectferroelectric thin film-
dc.subject$Pb_5Ge_3O_{11}$-
dc.title$Pb_5Ge_3O_{11}$ 강유전체 박막과 $HfAl_xO_y$ (x=0 또는 0.81) 유전체 박막을 이용한 MFIS 커패시터의 제조 및 특성 평가 = Fabrication and characterization of MFIS capacitors using ferroelectric $Pb_5Ge_3O_{11}$ and dielectric $HfAl_xO_y$ (x=0 or 0.81) thin films-
dc.typeThesis(Ph.D)-
dc.identifier.CNRN181087/325007-
dc.description.department한국과학기술원 : 재료공학과, -
dc.identifier.uid000985147-
dc.contributor.localauthor박정호-
dc.contributor.localauthorPark, Jeong-Ho-
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MS-Theses_Ph.D.(박사논문)
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