DC reactive sputtering법을 이용한 $RuO_x$ 하부전극 형성과 고유전 $(Ba,Sr)TiO_3$ 박막의 특성 평가에 관한 연구Preparation of $RuO_x$ bottom electrode by DC reactive sputtering and characterization of $(Ba,Sr)TiO_3$ thin films
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 김호기 | - |
| dc.contributor.advisor | Kim, Ho-Gi | - |
| dc.contributor.author | 안준형 | - |
| dc.contributor.author | Ahn, Joon-Hyung | - |
| dc.date.accessioned | 2011-12-15T01:03:37Z | - |
| dc.date.available | 2011-12-15T01:03:37Z | - |
| dc.date.issued | 1998 | - |
| dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=143457&flag=dissertation | - |
| dc.identifier.uri | http://hdl.handle.net/10203/50219 | - |
| dc.description | 학위논문(박사) - 한국과학기술원 : 재료공학과, 1998.8, [ iv, 156 p. ] | - |
| dc.language | kor | - |
| dc.publisher | 한국과학기술원 | - |
| dc.subject | 하부전극 | - |
| dc.subject | (Ba,Sr)TiO3 | - |
| dc.subject | RuOx | - |
| dc.subject | DC 반응성 스퍼터링 | - |
| dc.subject | 누설전류 | - |
| dc.subject | Leakage current | - |
| dc.subject | Bottom electrode | - |
| dc.subject | (Ba,Sr)TiO3 | - |
| dc.subject | RuOx | - |
| dc.subject | DC reactive sputtering | - |
| dc.title | DC reactive sputtering법을 이용한 $RuO_x$ 하부전극 형성과 고유전 $(Ba,Sr)TiO_3$ 박막의 특성 평가에 관한 연구 | - |
| dc.title.alternative | Preparation of $RuO_x$ bottom electrode by DC reactive sputtering and characterization of $(Ba,Sr)TiO_3$ thin films | - |
| dc.type | Thesis(Ph.D) | - |
| dc.identifier.CNRN | 143457/325007 | - |
| dc.description.department | 한국과학기술원 : 재료공학과, | - |
| dc.identifier.uid | 000945232 | - |
| dc.contributor.localauthor | 안준형 | - |
| dc.contributor.localauthor | Ahn, Joon-Hyung | - |
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