DC reactive sputtering법을 이용한 $RuO_x$ 하부전극 형성과 고유전 $(Ba,Sr)TiO_3$ 박막의 특성 평가에 관한 연구 = Preparation of $RuO_x$ bottom electrode by DC reactive sputtering and characterization of $(Ba,Sr)TiO_3$ thin films

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Advisors
김호기researcherKim, Ho-Giresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
1998
Identifier
143457/325007 / 000945232
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 재료공학과, 1998.8, [ iv, 156 p. ]

Keywords

하부전극; (Ba,Sr)TiO3; RuOx; DC 반응성 스퍼터링; 누설전류; Leakage current; Bottom electrode; (Ba,Sr)TiO3; RuOx; DC reactive sputtering

URI
http://hdl.handle.net/10203/50219
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=143457&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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