(A) study on the ruthenium thin films formed by atomic layer deposition (ALD)ALD 증착법으로 형성된 ruthenium 박막의 특성에 관한 연구
- Advisors
- Kang, Sang-Wonresearcher; 강상원researcher
- Description
- 한국과학기술원 : 신소재공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 2004
- Identifier
- 240659/325007 / 020015025
- Language
- eng
- Description
학위논문(박사) - 한국과학기술원 : 신소재공학과, 2004.8, [ xi, 123 p. ]
- Keywords
ANODE; ADHESION LAYERY; ALD; RU; TRANSITION METAL OXIDE; Si; 접착력 개선 속산화물; 원자층 증착법; Ru; SI
- Appears in Collection
- MS-Theses_Ph.D.(박사논문)
- Files in This Item
- There are no files associated with this item.
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