ALD 방법으로 형성된 다층 절연박막의 설계 및 특성에 관한 연구A study on the design and characterization of dielectric multilayer stacks prepared by atomic layer deposition method

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Advisors
박종욱researcherPark, Chong-Ookresearcher
Description
한국과학기술원 : 신소재공학과,
Publisher
한국과학기술원
Issue Date
2009
Identifier
327749/325007  / 020055829
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 신소재공학과, 2009. 8., [ x, 133 p. ]

Keywords

Silicon Oxide; Aluminum Oxide; Atomic layer deposition; Conduction Mechanism; Defect; 원자층 증착 방법; 전도기구; 구조결함

URI
http://hdl.handle.net/10203/49722
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=327749&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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