RF magnetron sputtering 증착공정에서 플라즈마 특성과 비정질 $CN_x$ 박막성질의 상관관계에 관한 연구A study on the correlation between the plasma and amorphous $CN_x$ film characteristics using RF magnetron sputtering
- Advisors
- 최시경researcher; Choi, Si-Kyungresearcher
- Description
- 한국과학기술원 : 신소재공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 2011
- Identifier
- 466401/325007 / 020055825
- Language
- kor
- Description
학위논문(박사) - 한국과학기술원 : 신소재공학과, 2011.2, [ vii, 73 p. ]
- Keywords
경도; 마그네트론 스퍼터링; 플라즈마; 질화탄소박막; 퓨리에변환 `적외선 분광 감지법; FTIR; hardness; magnetron sputtering; plasma; Carbon nitride
- Appears in Collection
- MS-Theses_Ph.D.(박사논문)
- Files in This Item
- There are no files associated with this item.
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