유도 결합 플라즈마를 이용한 HgCdTe 건식 식각에 관한 연구Study on HgCdTe dry etching using inductively coupled plasma
- Advisors
- 이희철researcher; Lee, Hee-Chulresearcher
- Description
- 한국과학기술원 : 전기및전자공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1999
- Identifier
- 156256/325007 / 000973185
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 전기및전자공학과, 1999.8, [ [ii], 56 p. ]
- Keywords
유도결합 플라즈마; 건식 식각; 고분자; Polymer; ICP; Dry etching
- Appears in Collection
- EE-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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