ECR $N_2O$-플라즈마 산화 및 응용Ecr $N_2O$-plasma oxidation and its applications
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 이희철 | - |
| dc.contributor.advisor | Lee, Hee-Chul | - |
| dc.contributor.author | 이진우 | - |
| dc.contributor.author | Lee, Jin-Woo | - |
| dc.date.accessioned | 2011-12-14T01:39:10Z | - |
| dc.date.available | 2011-12-14T01:39:10Z | - |
| dc.date.issued | 1996 | - |
| dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=106401&flag=dissertation | - |
| dc.identifier.uri | http://hdl.handle.net/10203/36869 | - |
| dc.description | 학위논문(석사) - 한국과학기술원 : 전기 및 전자공학과, 1996.2, [ iv, 85 p. ] | - |
| dc.language | kor | - |
| dc.publisher | 한국과학기술원 | - |
| dc.subject | 다결정 실리콘 | - |
| dc.subject | 얇은 게이트 산화막 | - |
| dc.subject | 질화 산화막 | - |
| dc.subject | ECR N2O-플라즈마 | - |
| dc.subject | 다결정 산화막 | - |
| dc.subject | Polyoxide | - |
| dc.subject | Polysilicon TFT | - |
| dc.subject | Thin gate oxide | - |
| dc.subject | Oxynitride | - |
| dc.subject | ECR N2O-Plasma | - |
| dc.title | ECR $N_2O$-플라즈마 산화 및 응용 | - |
| dc.title.alternative | Ecr $N_2O$-plasma oxidation and its applications | - |
| dc.type | Thesis(Master) | - |
| dc.identifier.CNRN | 106401/325007 | - |
| dc.description.department | 한국과학기술원 : 전기 및 전자공학과, | - |
| dc.identifier.uid | 000943446 | - |
| dc.contributor.localauthor | 이희철 | - |
| dc.contributor.localauthor | Lee, Hee-Chul | - |
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- EE-Theses_Master(석사논문)
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