Synthesis of norbornene copolymers with β-keto ester groups and their application as photoresists베타-케토 에스테르기를 노르보넨 측쇄에 함유하는 공중합체의 합성과 포토레지스트로서의 응용

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New norbornene-based monomers having β-keto ester group (methyl(5- norbornenyl)-3-oxopropionate (MNOP), 2-tert-butylcarboxylate-5,8-methanooctal one) (TBCMO)) were synthesized. Methyl(5-norbornenyl)-3-oxopropionate (MNOP) and 2-tert-butylcarboxylate-5,8-methanooctalone (TBCMO) were copolymerized with maleic anhydride (MA) and 2-tert-butyl-5-norbornene-2-carboxylate(TBNC). And 2-tert-butylcarboxylate-5,8-methanooctalone (TBCMO) was copolymerized with maleic anhydride (MA). The decomposition temperature of the resulting polymers were measured. The glass transition temperature of the resulting polymers did not detected. The polymers showed excellent transmittance at 248 nm, but high absorbance at 193 nm. The work of adhesion of the polymers were measured. The resist formulated with poly(2-tert-butylcarboxylate-5,8-methanooctalone-co-maleicanhydride) (poly(TBCMO-co-MA)) and poly(2-tert-butylcarboxylate-5,8-methanooctalone-co-maleicanhydride-co-2-tert-butyl-5-norbornene-2-carboxylate) (poly(TBCMO-co-MA-co-TBNC)) did not gave fine patterns due to keto-enol tautomerism and acidity of a-hydrogen. Poly(methyl(5-norbornenyl)-3-oxopropionate-co-maleic anhydride-co-tert-butyl-5-norbornene-2-carboxylate) (poly(MNOP-co-MA-co-TBNC)) was evaluated as a resist for an ArF excimer laser lithography. And a 0.6μm line/space pattern profiles obtained using the Deep UV exposures with a filter transmitting light between 220 nm and 260 nm.
Advisors
Kim, Jin-Baekresearcher김진백researcher
Description
한국과학기술원: 화학과,
Publisher
한국과학기술원
Issue Date
2001
Identifier
165868/325007 / 000993052
Language
eng
Description

학위논문(석사) - 한국과학기술원: 화학과, 2001.2, [ x, 67 p. ]

Keywords

lithography; photoresist; 베타-케토 에스테르; 리소그라피; 포토레지스트

URI
http://hdl.handle.net/10203/31882
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=165868&flag=dissertation
Appears in Collection
CH-Theses_Master(석사논문)
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