(The) selective metal deposition in block copolymer nanostructures

Abstract

The block copolymers (BCPs), which the chemically distinct monomer units are grouped in discrete blocks along the polymer chain, have attracted attention as the soft matter candidates for replacing conventional top-down lithography. The BCP lithography is the relatively simple and low-cost process to generate the high-resolution (< 100 nm) nanostructures, so the vast amounts of applications have been reported such as transistors, catalysts, sensors and membranes. Especially on transistor applications, the interlayer pattern transfer step reduction and the three- dimensional (3D) interconnected structures metallization are required for next-generation nanostructures fabrication, but the methodologies are not well established yet. In this dissertation, we demonstrate the selective deposition of metal and metal precursor inclusion as the enhanced metallization strategies for overcoming the as-mentioned hurdles. These metallization strategies can provide the fascinating metallization route on BCP nanofabrication fields and open the new avenues for practical applications based on its.