Oxetane-containing compound, photoresist composition having the same, method of preparing pattern, and inkjet print head옥세탄 함유 화합물, 포토레지스트 조성물, 패턴 제조 방법 잉크젯 프린트헤드
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Jin-Baek | ko |
| dc.contributor.author | Kim, Su-min | ko |
| dc.contributor.author | Park, Ji-young | ko |
| dc.contributor.author | Ha, Young-ung | ko |
| dc.contributor.author | Kim, Jin-baek | ko |
| dc.contributor.author | Park, Byung-ha | ko |
| dc.date.accessioned | 2022-12-26T03:00:40Z | - |
| dc.date.available | 2022-12-26T03:00:40Z | - |
| dc.identifier.uri | http://hdl.handle.net/10203/303689 | - |
| dc.description.abstract | An oxetane-containing compound, a photoresist composition including the same, a method of preparing patterns using the photoresist composition, and an inkjet print head including polymerization products of the oxetane-containing compound. | - |
| dc.title | Oxetane-containing compound, photoresist composition having the same, method of preparing pattern, and inkjet print head | - |
| dc.title.alternative | 옥세탄 함유 화합물, 포토레지스트 조성물, 패턴 제조 방법 잉크젯 프린트헤드 | - |
| dc.type | Patent | - |
| dc.type.rims | PAT | - |
| dc.contributor.localauthor | Kim, Jin-Baek | - |
| dc.contributor.nonIdAuthor | Kim, Su-min | - |
| dc.contributor.nonIdAuthor | Park, Ji-young | - |
| dc.contributor.nonIdAuthor | Ha, Young-ung | - |
| dc.contributor.nonIdAuthor | Kim, Jin-baek | - |
| dc.contributor.nonIdAuthor | Park, Byung-ha | - |
| dc.contributor.assignee | KAIST | - |
| dc.identifier.iprsType | 특허 | - |
| dc.identifier.patentApplicationNumber | 200710126352.1 | - |
| dc.identifier.patentRegistrationNumber | 101190903 | - |
| dc.date.application | 2007-06-29 | - |
| dc.date.registration | 2011-05-18 | - |
| dc.publisher.country | CC | - |
- Appears in Collection
- CH-Patent(특허)
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