Parallelization of pump devices is a direct way to increase the output level of the single-electron pump, which is required for metrological purposes. We fabricated a pair of single-electron pumps in parallel on a chip level and investigated their synchronized electron pumping phenomena. In the investigation, the pumping error was estimated to see whether the error was increased after the parallelization. We found that a proper choice of rf gates must be made in accordance with the direction of the applied magnetic field. In relation with the chirality of the edge state, the rf modulating gates should be chosen not to produce rf-induced heating effects.