Tomography-based spatial uniformity diagnostics for meter-sized plasmas

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dc.contributor.authorJang, Juhyeokko
dc.contributor.authorPark, Sanghooko
dc.contributor.authorPark, Jooyoungko
dc.contributor.authorChoe, Wonhoko
dc.date.accessioned2018-11-12T04:17:59Z-
dc.date.available2018-11-12T04:17:59Z-
dc.date.created2018-10-22-
dc.date.created2018-10-22-
dc.date.created2018-10-22-
dc.date.created2018-10-22-
dc.date.created2018-10-22-
dc.date.created2018-10-22-
dc.date.issued2018-10-
dc.identifier.citationPLASMA SOURCES SCIENCE & TECHNOLOGY, v.27, no.10, pp.10LT01-
dc.identifier.issn0963-0252-
dc.identifier.urihttp://hdl.handle.net/10203/246308-
dc.description.abstractOptical emission spectral tomography diagnostics have been developed to measure the spatial uniformity of meter-sized processing plasmas. The lines of sight and detector location are selected based on tomographic reconstruction tests using synthetic (phantom) images. The developed collection optics system is composed of slits, a plano-convex lens, optical interference filters and photodiode arrays. Using the collection optics, the line-integrated emission intensity is acquired from a meter-sized rectangular argon plasma (inductively coupled plasma at a frequency of 13.56 MHz), which was developed for display panel manufacturing. From the measured intensity, two-dimensional (2D) spatial distributions of argon atomic line intensity (675.3 nm and 852.1 nm) are obtained via the tomographic reconstruction technique based on the Phillips-Tikhonov regularization. In addition, 2D profiles of the electron excitation temperature (T-exc) are obtained from those of Ar intensity at the wavelengths 675.3 nm and 852.1 nm via two line method (in essence, a Boltzmann plot). The 2D argon plasma emission and T-exc profiles match well with the shape of the electrode and etch rate profile.-
dc.languageEnglish-
dc.publisherIOP PUBLISHING LTD-
dc.titleTomography-based spatial uniformity diagnostics for meter-sized plasmas-
dc.typeArticle-
dc.identifier.wosid000446882700001-
dc.identifier.scopusid2-s2.0-85055449872-
dc.type.rimsART-
dc.citation.volume27-
dc.citation.issue10-
dc.citation.beginningpage10LT01-
dc.citation.publicationnamePLASMA SOURCES SCIENCE & TECHNOLOGY-
dc.identifier.doi10.1088/1361-6595/aac671-
dc.contributor.localauthorPark, Sanghoo-
dc.contributor.localauthorChoe, Wonho-
dc.description.isOpenAccessY-
dc.type.journalArticleArticle-
dc.subject.keywordAuthoretching-
dc.subject.keywordAuthoroptical emission spectroscopy-
dc.subject.keywordAuthortomography-
dc.subject.keywordAuthorplasma uniformity-
dc.subject.keywordPlusPHILLIPS-TIKHONOV REGULARIZATION-
dc.subject.keywordPlusGENERALIZED CROSS-VALIDATION-
dc.subject.keywordPlusSCALE INTEGRATED-CIRCUIT-
dc.subject.keywordPlusKSTAR PLASMAS-
dc.subject.keywordPlusRECONSTRUCTION-
dc.subject.keywordPlusREACTORS-
dc.subject.keywordPlusSYSTEM-
dc.subject.keywordPlusCAMERA-
dc.subject.keywordPlusIMAGE-
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