Fabrication and Characterization of Triboelectric Generator using wafer-scale and uniformly-aligned 50 nm grating pattern

Abstract

Triboelectric nanogenerator (TENG), recently developed with unparalleled output performance and facile device fabrication, has received drastic attractions for power supplying from ambient mechanical sources such as water/wind flow, machine movement, and human motion. In contact electrification for accumulating triboelectric charge, it is important to establish the micrometer or nanometer scale morphologies into surface to induce the enhanced electric potential in same area. However, the researches associated with perfectly-aligned nanopattern and quantitative analysis in generation of triboelectric charge have been deficient owing to the difficulty of uniform pattern formation. Herein, we report the perfectly-arrayed and seamless nanograting pattern fabrication methods using modified spacer lithography. Using alternatively laminated spacers and polysilicon layers, multistep pattern downscaling up to 50 nm is realized in large-area substrate. Subsequently, nanograting pattern transfer onto flexible substrate by replication methods and application in TENG components are conducted. Quantitative measurements are possible due to outstanding alignments of nanograting pattern as well as description of the enhanced output performances with nanostructures. These approaches are expected to suggest the new analysis tools in TENG research for adjustment of triboelectric charge amount or electrical output with various applications.