Copolymers containing N-vinyllactam derivatives, preparation methods thereof and photoresists therefrom
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김진백 | ko |
| dc.date.accessioned | 2017-12-20T11:18:12Z | - |
| dc.date.available | 2017-12-20T11:18:12Z | - |
| dc.date.issued | 2000-04-18 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/233804 | - |
| dc.description.abstract | Copolymers containing N-vinyllactam derivatives protected at 3-position are provided and represented by the following formula. The copolymers are used as a photoresist material suitable for deep uv process so that high sensitivity and resolution can be obtained. In addition, ultrafine circuits can be formed and an exceptional improvement in PED stability can be accomplished by use of the photoresist. ##STR1## | - |
| dc.title | Copolymers containing N-vinyllactam derivatives, preparation methods thereof and photoresists therefrom | - |
| dc.type | Patent | - |
| dc.type.rims | PAT | - |
| dc.contributor.localauthor | 김진백 | - |
| dc.contributor.assignee | Hyundai Electronics Industries Co., Ltd. | - |
| dc.identifier.iprsType | 특허 | - |
| dc.identifier.patentApplicationNumber | 08816305 | - |
| dc.identifier.patentRegistrationNumber | 6051678 | - |
| dc.date.application | 1997-03-13 | - |
| dc.date.registration | 2000-04-18 | - |
| dc.publisher.country | US | - |
- Appears in Collection
- CH-Patent(특허)
- Files in This Item
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.