Polymer using norbornene monomers with derivatives of cholic acid, deoxycholic acid or lithocholic acid and use thereof노르보르넨 콜릭산, 다옥시콜리산 유도체를 결합시킨 단량체를 이용한 중합체 및 용도
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김진백 | ko |
| dc.date.accessioned | 2017-12-20T11:18:09Z | - |
| dc.date.available | 2017-12-20T11:18:09Z | - |
| dc.date.issued | 2001-07-10 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/233802 | - |
| dc.description.abstract | The present invention relates to a polymer prepared by synthesizing monomer having a derivative of cholic acid, deoxycholic acid or lithocholic acid bonded to norbornene, and then homopolymerizing these monomer, copolymerizing these monomer with maleic anhydride, or copolymerizing these monomer, maleic anhydride and 2-hydroxyethyl 5-norbornene-2-carboxylate and/or 5-norbornene-2carboxylic acid, and its use as a photoresist. The polymer synthesized according to the present invention is dissolved in a solvent, together with a photo-acid generator, and filtered through a filter to make a photoresist solution which can be used to produce a lithographic image on a silicon wafer. ##STR1## | - |
| dc.title | Polymer using norbornene monomers with derivatives of cholic acid, deoxycholic acid or lithocholic acid and use thereof | - |
| dc.title.alternative | 노르보르넨 콜릭산, 다옥시콜리산 유도체를 결합시킨 단량체를 이용한 중합체 및 용도 | - |
| dc.type | Patent | - |
| dc.type.rims | PAT | - |
| dc.contributor.localauthor | 김진백 | - |
| dc.contributor.assignee | Korea Advanced Institute of Science and Technology | - |
| dc.identifier.iprsType | 특허 | - |
| dc.identifier.patentApplicationNumber | 09514220 | - |
| dc.identifier.patentRegistrationNumber | 6258508 | - |
| dc.date.application | 2000-02-25 | - |
| dc.date.registration | 2001-07-10 | - |
| dc.publisher.country | US | - |
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- CH-Patent(특허)
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