Polymer using norbornene monomers with derivatives of cholic acid, deoxycholic acid or lithocholic acid and use thereof 노르보르넨 콜릭산, 다옥시콜리산 유도체를 결합시킨 단량체를 이용한 중합체 및 용도

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The present invention relates to a polymer prepared by synthesizing monomer having a derivative of cholic acid, deoxycholic acid or lithocholic acid bonded to norbornene, and then homopolymerizing these monomer, copolymerizing these monomer with maleic anhydride, or copolymerizing these monomer, maleic anhydride and 2-hydroxyethyl 5-norbornene-2-carboxylate and/or 5-norbornene-2carboxylic acid, and its use as a photoresist. The polymer synthesized according to the present invention is dissolved in a solvent, together with a photo-acid generator, and filtered through a filter to make a photoresist solution which can be used to produce a lithographic image on a silicon wafer. ##STR1##
Assignee
Korea Advanced Institute of Science and Technology
Country
US (United States)
Issue Date
2001-07-10
Application Date
2000-02-25
Application Number
09514220
Registration Date
2001-07-10
Registration Number
6258508
URI
http://hdl.handle.net/10203/233802
Appears in Collection
CH-Patent(특허)
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