PLASMA GENERATION APPARATUS

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<p id="p-0001" num="0000">A plasma generation apparatus includes a vacuum container, dielectrics connected to through-holes formed in the vacuum container, RF coils of the same structure disposed in the vicinity of the respective dielectrics and electrically connected in parallel, an RF power source to supply power to the RF coils, an impedance matching circuit disposed between the RF power source and the RF coils, and a power distribution unit disposed between the impedance matching circuit and one ends of the RF coils to distribute the power of the RF power source to the RF coils. The power distribution unit includes a power distribution line and a conductive outer cover enclosing the power distribution line. Distance between an input end of the power distribution unit and the RF coils are equal to each other, and the other ends of the RF coils are connected to the conductive outer cover to be grounded.</p>
Assignee
KAIST
Country
US (United States)
Issue Date
2015-06-23
Application Date
2013-11-18
Application Number
14082795
Registration Date
2015-06-23
Registration Number
9066413
URI
http://hdl.handle.net/10203/233130
Appears in Collection
PH-Patent(특허)
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