A Black Metal-dielectric Thin Film for High-contrast Displays

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We demonstrate a thin metal-dielectric structure that delivers low reflection and high absorption over the entire visible spectrum. The thin black film consists Of SiO(2)/Cr/SiO(2)/Al layers deposited on a glass substrate. The measured reflectance and absorptance of the black film are 0.7% and 99.3%, respectively, when averaged over the range 380 - 780 nm. The total thickness of the black film is only about 220 nm, and it can be used as a thin absorbing layer for displays that require both broadband antireflection and high-contrast characteristics.
Publisher
KOREAN PHYSICAL SOC
Issue Date
2009-08
Language
English
Article Type
Article
Keywords

LIGHT-EMITTING-DIODES; BAND ANTIREFLECTION COATINGS; OPTICAL-PROPERTIES; ALLOY-FILMS; CATHODE; ENHANCEMENT; FABRICATION; LAYER; INTERFERENCE; REFLECTION

Citation

JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.55, pp.501 - 507

ISSN
0374-4884
URI
http://hdl.handle.net/10203/23285
Appears in Collection
PH-Journal Papers(저널논문)
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