Photoresist composition, method of forming pattern using the photoresist composition and inkjet print head

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A photoresist composition including an oxetane-containing compound represented by Formula 1 or 2, an oxirane-containing compound represented by Formula 3 or 4, a photoinitiator, and a solvent, a method of forming a pattern using the photoresist composition, and an inkjet print head including a polymerization product of the photoresist composition.The photoresist composition provides a polymerization product which resists formation of cracks due to an inner stress, and has excellent heat tolerance, excellent chemical resistance, excellent adhesiveness, and excellent durability.
Assignee
Samsung Electronics Co., Ltd.
Country
US (United States)
Issue Date
2012-04-24
Application Date
2008-02-29
Application Number
12040009
Registration Date
2012-04-24
Registration Number
8163463
URI
http://hdl.handle.net/10203/232507
Appears in Collection
CH-Patent(특허)
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