FABRICATION OF INGAAS/INP AVALANCHE PHOTODIODES BY REACTIVE ION ETCHING USING CH4/H-2 GASES

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Publisher
AMER INST PHYSICS
Issue Date
1995
Language
English
Article Type
Article
Keywords

BURIED-HETEROSTRUCTURE LASER; CHEMICAL VAPOR-DEPOSITION; GAIN-BANDWIDTH PRODUCT; INP; HYDROGEN; PHOTODETECTORS; PASSIVATION; ACCEPTORS; METHANE

Citation

JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.13, no.3, pp.974 - 977

ISSN
1071-1023
URI
http://hdl.handle.net/10203/23223
Appears in Collection
PH-Journal Papers(저널논문)
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