Plasma device and substrate board treatment

Abstract

The present invention relates to a kind of plasma generating equipment and substrate board treatment.Plasma generating equipment includes：Multiple dielectric tubes, the plurality of dielectric tube is separately mounted in the multiple through holes being formed in Dewar vessel；Antenna, based on arrangement symmetries of the antenna in the Dewar vessel, the antenna is divided into first antenna group and the second antenna sets, and is separately mounted to outside the dielectric tube；First RF power sources, a RF power sources are used to supply power to the first antenna group；2nd RF power sources, the 2nd RF power sources are used to supply power to second antenna sets；And first power distributing unit, first power distributing unit is arranged between the first antenna group and a RF power sources, by from the power distribution of a RF power sources to the first antenna group.