Fabrication of block copolymer templates by using dually responsive photoresist bottom layers

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A simple and novel method was developed to fabricate a nanoporous template by using a bilayer system composed of a silicon-containing block copolymer top layer and a dually responsive photoresist bottom layer. The dually responsive bottom layer became cross-linked by heating. The cross-linked polymer was mechanically hard and insoluble in common solvents. The block copolymer pattern was transferred to the bottom layer by oxygen reactive ion etching. High-aspect-ratio nanopore arrays were generated. The cross-linked bottom layer became soluble again by chain scission upon exposure to UV light. Therefore, the template with a highly orientated array of cylindrical nanopores could be easily removed by dipping in an aqueous base solution. This versatile template of nanoporous structures could be used to create freestanding 1D nanostructures of a variety of functional materials.
Publisher
ELSEVIER SCIENCE BV
Issue Date
2017-09
Language
English
Article Type
Article
Keywords

NANOPOROUS TEMPLATES; DIBLOCK COPOLYMER; NANOROD ARRAYS; NANOPARTICLES; NANOWIRE; NANOSTRUCTURES; DEPOSITION; SUBSTRATE; MICELLES; SILICA

Citation

REACTIVE & FUNCTIONAL POLYMERS, v.118, pp.20 - 25

ISSN
1381-5148
DOI
10.1016/j.reactfunctpolym.2017.07.001
URI
http://hdl.handle.net/10203/226129
Appears in Collection
CH-Journal Papers(저널논문)
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