Precise study of contact resistance lowering mechanism in MoS2 FET with refined resistance network model
- Publisher
- 제 4회 한국 그래핀 심포지엄
- Issue Date
- 2017-04-06
- Language
- English
- Citation
제 4회 한국 그래핀 심포지엄
- Appears in Collection
- RIMS Conference Papers
- Files in This Item
- There are no files associated with this item.
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