Reproducibility of the cutoff probe for the measurement of electron density

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dc.contributor.authorKim, Dae Woongko
dc.contributor.authorYou, SJko
dc.contributor.authorKwon, JHko
dc.contributor.authorYou, KHko
dc.contributor.authorSeo, BHko
dc.contributor.authorKim, JHko
dc.contributor.authorYoon, JSko
dc.contributor.authorOh, Wang-Yuhlko
dc.date.accessioned2016-09-06T08:56:02Z-
dc.date.available2016-09-06T08:56:02Z-
dc.date.created2016-08-02-
dc.date.created2016-08-02-
dc.date.issued2016-06-
dc.identifier.citationPHYSICS OF PLASMAS, v.23, no.6-
dc.identifier.issn1070-664X-
dc.identifier.urihttp://hdl.handle.net/10203/212400-
dc.description.abstractSince a plasma processing control based on plasma diagnostics attracted considerable attention in industry, the reproducibility of the diagnostics using in this application has become a great interest. Because the cutoff probe is one of the potential candidates for this application, knowing the reproducibility of the cutoff probe measurement becomes quit important in the cutoff probe application research. To test the reproducibility of the cutoff probe measurement, in this paper, a comparative study among the different cutoff probe measurements was performed. The comparative study revealed remarkable result: the cutoff probe has a great reproducibility for the electron density measurement, i.e., there are little differences among measurements by different probes made by different experimenters. The discussion including the reason for the result was addressed via this paper by using a basic measurement principle of cutoff probe and a comparative experiment with Langmuir probe. Published by AIP Publishing-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.subjectINDUCTIVELY-COUPLED PLASMA-
dc.subjectLANGMUIR PROBE-
dc.subjectHAIRPIN RESONATOR-
dc.subjectDISCHARGE-
dc.titleReproducibility of the cutoff probe for the measurement of electron density-
dc.typeArticle-
dc.identifier.wosid000379172200105-
dc.identifier.scopusid2-s2.0-84973322944-
dc.type.rimsART-
dc.citation.volume23-
dc.citation.issue6-
dc.citation.publicationnamePHYSICS OF PLASMAS-
dc.identifier.doi10.1063/1.4947222-
dc.contributor.localauthorOh, Wang-Yuhl-
dc.contributor.nonIdAuthorYou, SJ-
dc.contributor.nonIdAuthorKwon, JH-
dc.contributor.nonIdAuthorYou, KH-
dc.contributor.nonIdAuthorSeo, BH-
dc.contributor.nonIdAuthorKim, JH-
dc.contributor.nonIdAuthorYoon, JS-
dc.type.journalArticleArticle-
dc.subject.keywordPlusINDUCTIVELY-COUPLED PLASMA-
dc.subject.keywordPlusLANGMUIR PROBE-
dc.subject.keywordPlusHAIRPIN RESONATOR-
dc.subject.keywordPlusDISCHARGE-
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