DC Field | Value | Language |
---|---|---|
dc.contributor.author | You, KH | ko |
dc.contributor.author | You, SJ | ko |
dc.contributor.author | Kim, DW | ko |
dc.contributor.author | Na, Byungkeun | ko |
dc.contributor.author | Seo, BH | ko |
dc.contributor.author | Kim, JH | ko |
dc.contributor.author | Chang, Hongyoung | ko |
dc.date.accessioned | 2016-07-07T04:58:14Z | - |
dc.date.available | 2016-07-07T04:58:14Z | - |
dc.date.created | 2016-06-13 | - |
dc.date.created | 2016-06-13 | - |
dc.date.issued | 2016-03 | - |
dc.identifier.citation | PHYSICS OF PLASMAS, v.23, no.3, pp.033509 | - |
dc.identifier.issn | 1070-664X | - |
dc.identifier.uri | http://hdl.handle.net/10203/209752 | - |
dc.description.abstract | As collisions between electrons and neutral particles constitute one of the most representative physical phenomena in weakly ionized plasma, the electron-neutral (e-n) collision frequency is a very important plasma parameter as regards understanding the physics of this material. In this paper, we measured the e-n collision frequency in the plasma using a calibrated cutoff-probe. A highly accurate reactance spectrum of the plasma/cutoff-probe system, which is expected based on previous cutoff-probe circuit simulations [Kim et al., Appl. Phys. Lett. 99, 131502 (2011)], is obtained using the calibrated cutoff-probe method, and the e-n collision frequency is calculated based on the cutoff-probe circuit model together with the high-frequency conductance model. The measured e-n collision frequency (by the calibrated cutoff-probe method) is compared and analyzed with that obtained using a Langmuir probe, with the latter being calculated from the measured electron-energy distribution functions, in wide range of gas pressure. (C) 2016 AIP Publishing LLC | - |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.subject | DENSITY | - |
dc.subject | PLASMAS | - |
dc.subject | CONDUCTIVITY | - |
dc.title | Measurement and analysis of electron-neutral collision frequency in the calibrated cutoff probe | - |
dc.type | Article | - |
dc.identifier.wosid | 000375854900091 | - |
dc.identifier.scopusid | 2-s2.0-84961635249 | - |
dc.type.rims | ART | - |
dc.citation.volume | 23 | - |
dc.citation.issue | 3 | - |
dc.citation.beginningpage | 033509 | - |
dc.citation.publicationname | PHYSICS OF PLASMAS | - |
dc.identifier.doi | 10.1063/1.4943876 | - |
dc.contributor.localauthor | Chang, Hongyoung | - |
dc.contributor.nonIdAuthor | You, KH | - |
dc.contributor.nonIdAuthor | You, SJ | - |
dc.contributor.nonIdAuthor | Kim, DW | - |
dc.contributor.nonIdAuthor | Seo, BH | - |
dc.contributor.nonIdAuthor | Kim, JH | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | DENSITY | - |
dc.subject.keywordPlus | PLASMAS | - |
dc.subject.keywordPlus | CONDUCTIVITY | - |
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