3D Tailored Crumpling of Block-Copolymer Lithography on Chemically Modified Graphene
Novel 3D self-assembled nanopatterning is presented via tailored crumpling of chemically modified graphene. Block-copolymer self-assembly formed on a layer of chemically modified graphene provides highly dense and uniform 2D nanopatterns, and the controlled crumpling of the chemically modified graphene by mechanical instabilities realizes the controlled 3D transformation of the self-assembled nanopatterns.
- Publisher
- WILEY-V C H VERLAG GMBH
- Issue Date
- 2016-02
- Language
- English
- Article Type
- Article
- Keywords
LARGE-AREA GRAPHENE; THIN-FILMS; SOLID-SURFACES; PATTERNS; ARRAYS; TEMPLATES; POLYMERS; LAYER; WATER; MULTIPLICATION
- Citation
ADVANCED MATERIALS, v.28, no.8, pp.1591 - 1596
- ISSN
- 0935-9648
- Appears in Collection
- MS-Journal Papers(저널논문)
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- There are no files associated with this item.
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