Development of multiple inductively coupled plasma sources using coaxial transmission line for large-area processes

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We have developed multiple inductively coupled plasma (ICP) sources for large-area processes. These multiple ICP sources are composed of 16 -small ICP sources in parallel. Simulations were performed to design multiple ICP sources that could generate uniform plasma by adjusting the lengths of the coaxial transmission line and the ground-return paths. Plasma distribution was measured with an array of ion saturation probes. We demonstrated that it is possible to generate uniform plasma when equal power is supplied to each source by equalizing the lengths of the coaxial transmission line as well as maintaining the same length for all the ground-return paths. To distribute equal power to each source, the impedance of the ground path is crucial because the total impedance of a small ICP source is strongly dependent on the distance between the power supply and the source. We confirmed that this approach enables multiple ICP sources to generate uniform plasma without the need for additional control equipment.
Publisher
ELSEVIER SCIENCE BV
Issue Date
2016-03
Language
English
Article Type
Article
Keywords

FREQUENCY CAPACITIVE DISCHARGES; STANDING-WAVE

Citation

CURRENT APPLIED PHYSICS, v.16, no.3, pp.415 - 420

ISSN
1567-1739
DOI
10.1016/j.cap.2015.12.020
URI
http://hdl.handle.net/10203/207941
Appears in Collection
PH-Journal Papers(저널논문)
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