Low-temperature growth of layered molybdenum disulphide with controlled clusters

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Layered molybdenum disulphide was grown at a low-temperature of 350 degrees C using chemical vapour deposition by elaborately controlling the cluster size. The molybdenum disulphide grown under various sulphur-reaction-gas to molybdenum-precursor partial-pressure ratios were examined. Using spectroscopy and microscopy, the effect of the cluster size on the layered growth was investigated in terms of the morphology, grain size, and impurity incorporation. Triangular single-crystal domains were grown at an optimized sulphur-reaction-gas to molybdenum-precursor partial-pressure ratio. Furthermore, it is proved that the nucleation sites on the silicon-dioxide substrate were related with the grain size. A polycrystalline monolayer with the 100-nm grain size was grown on a nucleation site confined substrate by high-vacuum annealing. In addition, a field-effect transistor was fabricated with a MoS2 monolayer and exhibited a mobility and on/off ratio of 0.15 cm(2)V(-1)s(-1) and 10(5), respectively.
Publisher
NATURE PUBLISHING GROUP
Issue Date
2016-02
Language
English
Article Type
Article
Keywords

CHEMICAL-VAPOR-DEPOSITION; MOS2 ATOMIC LAYERS; MONOLAYER MOS2; LARGE-AREA; THIN-LAYERS; GRAIN-BOUNDARIES; PHASE GROWTH; GRAPHENE; SIO2; NANOPARTICLES

Citation

SCIENTIFIC REPORTS, v.6

ISSN
2045-2322
DOI
10.1038/srep21854
URI
http://hdl.handle.net/10203/207622
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