DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | Kim, Jin-Baek | - |
dc.contributor.advisor | 김진백 | - |
dc.contributor.author | Shin, Han-Gyeol | - |
dc.contributor.author | 신한결 | - |
dc.date.accessioned | 2015-04-23T02:21:54Z | - |
dc.date.available | 2015-04-23T02:21:54Z | - |
dc.date.issued | 2014 | - |
dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=592513&flag=dissertation | - |
dc.identifier.uri | http://hdl.handle.net/10203/196434 | - |
dc.description | 학위논문(석사) - 한국과학기술원 : 화학과, 2014.8, [ v, 29 p. ] | - |
dc.description.abstract | In photolithography, air bubbles on the surface of a photoresist have been found to produce defects characterized by significant underexposure and geometry-dependent pattern distortion. The polymers with tertiary butyl groups, widely used for chemically amplified photoresists, release the volatile byproduct, isobutene, by acid-catalyzed deprotection reaction and produced air bubbles. A novel monomer for low-outgassing resist was synthesized. Tertiary caprolactone group was synthesized from camphor by Baeyer-Villiger oxidation. Tertiary caprolactone group was cleaved and the carboxylic acid functionality was formed by acid-catalyzed ring-opening reaction in the exposure region after post-exposure bake. This group do not produce volatile byproducts during the deprotection reaction. | eng |
dc.language | eng | - |
dc.publisher | 한국과학기술원 | - |
dc.subject | photolithography | - |
dc.subject | 단량체 | - |
dc.subject | 가스발생 | - |
dc.subject | 레지스트 | - |
dc.subject | 리소그래피 | - |
dc.subject | monomer | - |
dc.subject | photoresist | - |
dc.subject | outgassing | - |
dc.title | Study on low-outgassing resists | - |
dc.title.alternative | 저가스 발생형 레지스트에 대한 연구 | - |
dc.type | Thesis(Master) | - |
dc.identifier.CNRN | 592513/325007 | - |
dc.description.department | 한국과학기술원 : 화학과, | - |
dc.identifier.uid | 020118140 | - |
dc.contributor.localauthor | Kim, Jin-Baek | - |
dc.contributor.localauthor | 김진백 | - |
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