On the possibility of the multiple inductively coupled plasma and helicon plasma sources for large-area processes

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In this study, we attempted to determine the possibility of multiple inductively coupled plasma (ICP) and helicon plasma sources for large-area processes. Experiments were performed with the one and two coils to measure plasma and electrical parameters, and a circuit simulation was performed to measure the current at each coil in the 2-coil experiment. Based on the result, we could determine the possibility of multiple ICP sources due to a direct change of impedance due to current and saturation of impedance due to the skin-depth effect. However, a helicon plasma source is difficult to adapt to the multiple sources due to the consistent change of real impedance due to mode transition and the low uniformity of the B-field confinement. As a result, it is expected that ICP can be adapted to multiple sources for large-area processes.
Publisher
AMER INST PHYSICS
Issue Date
2014-08
Language
English
Article Type
Article
Keywords

DISCHARGES; FILM; DEPOSITION; ANTENNA

Citation

PHYSICS OF PLASMAS, v.21, no.8

ISSN
1070-664X
DOI
10.1063/1.4892170
URI
http://hdl.handle.net/10203/194543
Appears in Collection
PH-Journal Papers(저널논문)
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