Characterization and optimization of partially depleted SOI MOSFETs for high power RF switch applications

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Power handling capability is the most stringent specification for an RF switch. The dominant reason to limit the power handling capability is undesirable channel formation (leakage current) on off-state FEETs in the event of large signal input. To characterize leakage current and find the correlation between DC I-V measurement and RFP1 dB measurement, a new DC characterization method (Float FET I-V characterization method) reflecting RF switch operation is proposed. Based on the proposed Float FET I-V method, an experimental study on optimum dc bias point, MOSFET device design, and stacked-FETs device design is performed in order to achieve maximum power handling capability of the RF switch. In addition, compared to RF measurement tests that take a long time, the proposed characterization method rapidly evaluates the various off-state MOS-FET leakage current mechanisms affecting the power handling capability of the RF switch. (C) 2013 Elsevier Ltd. All rights reserved.
Publisher
PERGAMON-ELSEVIER SCIENCE LTD
Issue Date
2013-12
Language
English
Article Type
Article; Proceedings Paper
Citation

SOLID-STATE ELECTRONICS, v.90, pp.94 - 98

ISSN
0038-1101
DOI
10.1016/j.sse.2013.02.046
URI
http://hdl.handle.net/10203/187015
Appears in Collection
EE-Journal Papers(저널논문)
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