Phase shift effect of relief structured phase masks in proximity field nanopatterning근접장 나노패터닝에서 위상차 구조를 갖는 마스크의 단차변화 효과
- Advisors
- Jeon, Seok-Wooresearcher; 전석우
- Description
- 한국과학기술원 : 신소재공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 2012
- Identifier
- 487416/325007 / 020103138
- Language
- eng
- Description
학위논문(석사) - 한국과학기술원 : 신소재공학과, 2012.2, [ iv, 44 p. ]
- Keywords
Proximity field nanopatterning; Three dimensional nanosturacture; phase mask; phase optics; 근접장 나노패터닝; 위상차 마스크; 위상차 조건; 삼차원 나노구조; diffraction efficiency
- Appears in Collection
- MS-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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