UV-나노임프린트 리소그래피에서의 점착 및 잔류층 두께 측정에 관한 연구A study on adhesion characteristics and measurement of residual layer thickness in UV-nanoimprint lithography
- Advisors
- 김경웅researcher; Kim, Kyung-Woong
- Description
- 한국과학기술원 : 기계공학전공,
- Publisher
- 한국과학기술원
- Issue Date
- 2012
- Identifier
- 511293/325007 / 020075201
- Language
- kor
- Description
학위논문(박사) - 한국과학기술원 : 기계공학전공, 2012.8, [ viii, 120 p. ]
- Keywords
DCB 실험; 공정 조건; 점착력 측정; UV 나노임프린트 리소그래피; 잔류층 두께; UV-nanoimprint lithography; pull-off test; process condition; DCB test; residual layer thickness; capacitance measurement; 정전 용량 측정
- Appears in Collection
- ME-Theses_Ph.D.(박사논문)
- Files in This Item
- There are no files associated with this item.
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