Error propagation in calibration of E-beam lithography stages
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Yoo S. | - |
| dc.contributor.author | Kim, Seung-Woo | - |
| dc.date.accessioned | 2013-03-18T22:47:15Z | - |
| dc.date.available | 2013-03-18T22:47:15Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2003-04-16 | - |
| dc.identifier.citation | Photomask and Next-Generation Lithography Mask Technology X, v.5130, no., pp.339 - 346 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/153269 | - |
| dc.language | ENG | - |
| dc.title | Error propagation in calibration of E-beam lithography stages | - |
| dc.type | Conference | - |
| dc.identifier.scopusid | 2-s2.0-1642433103 | - |
| dc.type.rims | CONF | - |
| dc.citation.volume | 5130 | - |
| dc.citation.beginningpage | 339 | - |
| dc.citation.endingpage | 346 | - |
| dc.citation.publicationname | Photomask and Next-Generation Lithography Mask Technology X | - |
| dc.identifier.conferencecountry | Japan | - |
| dc.contributor.localauthor | Kim, Seung-Woo | - |
| dc.contributor.nonIdAuthor | Yoo S. | - |
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