The Role of Entanglement in Quantum Lithography

Cited 2 time in webofscience Cited 2 time in scopus
  • Hit : 639
  • Download : 106
We investigate the origin of the resolution improvement beyond the classical diffraction limit in quantum lithography. We show that the degree of the resolution improvement persists even when the pure entangled state of light initially prepared (the NOON state) is transformed to a mixed entangled state caused by phase and amplitude damping, regardless of file degree of entanglement remaining in the state. We also show that the resolution improvement beyond the classical diffraction limit can be achieved with a particular class of separable states of light. The resolution improvement in this case can be traced to entanglement (of the NOON type) that may be considered to be embedded in the separable state. We conclude that it is the existence of entanglement (of the NOON type) in the state Of light used, not details of entanglement such a, the degree of entanglement and relative weight of entanglement in the state, that determines the degree of the resolution improvement in quantum lithography. The visibility of the pattern and the total deposition rate, however, depend oil the details of entanglement.
Publisher
PHYSICAL SOC JAPAN
Issue Date
2008-12
Language
English
Article Type
Article
Keywords

INTERFEROMETRIC OPTICAL LITHOGRAPHY; SUB-RAYLEIGH-RESOLUTION; EXPLOITING ENTANGLEMENT; DIFFRACTION LIMIT; 2-PHOTON EXPOSURE; STATES; BEAT

Citation

JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, v.77

ISSN
0031-9015
DOI
10.1143/JPSJ.77.124001
URI
http://hdl.handle.net/10203/13822
Appears in Collection
PH-Journal Papers(저널논문)
Files in This Item
This item is cited by other documents in WoS
⊙ Detail Information in WoSⓡ Click to see webofscience_button
⊙ Cited 2 items in WoS Click to see citing articles in records_button

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0