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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

Characteristics of Ir and Ru as diffusion barriers for highly integrated memory devices

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Kim, Ho Giresearcher
Issue Date
2000-01-01
Language
ENG
Citation

International symposium on advanced materials 2000

URI
http://hdl.handle.net/10203/125902
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MS-Conference Papers(학술회의논문)
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