Ultra thin oxide grown on polysilicon by ECR(Electron Cyclotron Resonance) N2O Plasma
- Issue Date
- 2000
- Language
- ENG
- Citation
5th International Symposium on Plasma Process-Induced Damage 2000, no.2000, pp.133 - 136
- Appears in Collection
- RIMS Conference Papers
- Files in This Item
- There are no files associated with this item.
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