Adsorption and chemical reaction of Cu(hfac)(vtms) on CU(111)
We have investigated the adsorption and reaction of Cu(hfac) (vtms) (hexafluoroacetylacetonate, hfac; vinyl trimethyl silane, vtms) on a Cu(1 1 1) surface. The recombinative desorption of Cu(hfac)(vtms) and disproportionation reaction between adsorbed Cu(hfac) molecules were observed to occur between 240 and 400 K. The adsorption geometries of Cu(hfac) on Cu(1 1 1) have been also calculated by means of the extended Huckel method. It is found that the standing Cu(hfac) is more stable and favored for a cleavage of Cu-O bonds than the lying-down Cu(hfac) on the Cu(1 1 1) surface. (C) 2001 Elsevier Science B.V. All rights reserved.
- Publisher
- ELSEVIER SCIENCE BV
- Issue Date
- 2001-06
- Language
- English
- Article Type
- Article; Proceedings Paper
- Keywords
VAPOR-DEPOSITION PRECURSORS; THIN-FILM GROWTH; ADSORPTION/DESORPTION BEHAVIOR; COPPER; SURFACES; SILICA; FTIR; CVD; (1,1,1,5,5,5-HEXAFLUOROACETYLACETONATO)(VINYLTRIMETHYLSILANE)COPPER(I); (HFAC)CU(VTMS)
- Citation
SURFACE SCIENCE, v.482, pp.312 - 317
- ISSN
- 0039-6028
- Appears in Collection
- CH-Journal Papers(저널논문)
- Files in This Item
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