Novel top-surface imaging process by selective chemisorption of poly(dimethyl siloxane) on diazoketo-functionalized single component photoresist

Abstract

A novel top-surface imaging process was successfully established using selective chemisorption of amine-functionalized poly(dimethly siloxane) onto the carboxylic groups formed on the surace of diazoketo-functionalized polymer film by UV light irradiation. The chemisorbed poly(dimethyl siloxane) worked as an efficient etch mask for the subsequent oxygen plasma etching process for pattern generation. High-resolution patterns were resolved with the new imaging process.