A New Type of Eco-Friendly Resist Based on Nonchemically Amplified System

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Novel water-processable photopolymers were designed to be useful as environment-friendly photolithographic materials. By copolymerization of 2-(2-diazo-3-oxo-butyryloxy)ethyl methacrylate (DOBEMA), hydroxyethyl methacrylate (HEMA), methacryllic acid (NLAA), and sodium 4-vinylbenzenesulfonate (SVBS), two kinds of polymers, poly(DOBEMA-co-HENIA-co-SVBS) for negative-tone resist and poly(DOBEMA-co-MAA) for positive-tone resist, were synthesized and their photolithographic properties were investigated. The single component negative-tone resist produced 0.8 mu m line and space patterns using a mercury-xenon lamp in a contact printing mode using pure water as casting and developing solvent at a exposure dose of 25 mJ cm(-2). On the other hand, the single component positive-tone resist produced 0.8 mu m line and space patterns at a much higher dose of 150 mJ cm(-2). Thus, the negative resist showed much improved sensitivity when compared with the positive resist and the reported nonchemically amplified resists. This sensitivity is comparable with those of typical chemically amplified resists. (C) 2008 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 46: 7534-7542, 2008
Publisher
JOHN WILEY SONS INC
Issue Date
2008-11
Language
English
Article Type
Article
Keywords

REDUCED ENVIRONMENTAL-IMPACT; PHOTO-CROSS-LINKING; PHOTORESISTS; LITHOGRAPHY

Citation

JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, v.46, no.22, pp.7534 - 7542

ISSN
0887-624X
DOI
10.1002/pola.23059
URI
http://hdl.handle.net/10203/10539
Appears in Collection
CH-Journal Papers(저널논문)
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